Company : |
Dynatec Co., Ltd. |
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Location : |
Head office
/ Matsumoto Factory |
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5511-5 Wada Ooaza, Matsumoto-Shi, Nagano, 390-1242, Japan (Located in the Matsumoto Rinku Industry Park) |
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Toyoshina Factory |
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1076-2 Toyoshinatakaya, Azumino-Shi, Nagano, 399-8204, Japan |
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Tianjin Factory, China |
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No.39-10 Yijing-Road Dongli Economic Development Area |
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Founded : |
October 26, 1946 |
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President and
Managing Director :
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Yuji Nakajima |
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Capital : |
50 million yen |
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No. of employees : |
100 |
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Business domains : |
| [Matsumoto Factory] |
EMI shielding (Vacuum deposition / ion plating)
Non-conductive coating
Optical thin film deposition
AR coating
Exterior coating
Plastics molding Printing / Laser cutting
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| [Tianjin Factory, China] |
EMI shielding
Non-conductive coating
Optical thin film deposition
Exterior coating |
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| [Toyoshina Factory] |
Electroless nickel plating / Fe, Al, Mg, SUS, and so forth
Anodizing / Mg material
Honing / Al and Mg
Metalworking / Die-casting / Mg, SUS, Al, and so forth |
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Oct. 1946
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The company was founded, and started operating in Shirasaka, Matsumoto city. |
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Oct. 1953
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The company was registered as the Nakajima Denka Kogyo Co., Ltd. |
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May. 1958
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The Toyoshina Factory was newly built in Toyoshinatakaya, Azumino City, and started operating. |
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Apr. 1959
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The Shiojiri Factory was newly built in Hirookano Village, Shiojiri City, and started operating. |
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Apr. 1978
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The Toyoshina Factory was fully renovated and expanded. |
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Apr. 1988
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Office computers were introduced to start a production control system (developed in-house). |
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Jan. 1990
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The company was renamed "Dynatec Co., Ltd." |
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Jun. 1990
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The Matsumoto Factory was completed in the Matsumoto Rinku Industrial Park. |
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Jul. 1990
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A large AL deposition apparatus for EMI shielding started operating. |
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Oct. 1991
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An additional large AL deposition apparatus for EMI shielding was installed, and started operating. |
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Oct. 1994
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A large ion-plating apparatus for EMI shielding (Dyvac method) was developed, and started operating. |
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Aug. 1996
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A second large ion-plating apparatus for EMI shielding was installed, and started operating. |
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Oct. 1997
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The Matsumoto Factory was expanded. |
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Nov. 1997
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A third large ion-plating apparatus was installed, and started operating. |
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Nov. 1998
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A second line was added in the Toyoshina Factory (Phase II). |
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May. 2000
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The expansion of the Matsumoto Factory (Phase II) was completed. |
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Jun. 2000
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A new automatic coating line was installed in the Matsumoto Factory, and started operating. |
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Sep. 2000
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A clean room was newly established in the Matsumoto Factory. |
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Oct. 2000
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Two inline optical thin film deposition apparatuses were newly installed, and started operating. |
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Jul. 2001
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The expansion of the Matsumoto Factory (Phase III) was completed. |
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Aug. 2001
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Two inline additional optical thin film deposition apparatuses were installed. |
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Dec. 2001
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A joint venture was established in Dong Guan, Guangdong, China. |
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Feb. 2002
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A large ion-plating apparatus started operating in the Dong Guan Factory. |
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May. 2002
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The head office and the Matsumoto Factory were ISO9001: 2000 certified. |
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Jun. 2003
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An optical multi-layer film deposition apparatus was installed, and started operating. |
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Jan. 2004
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A sputtering apparatus (for a bright finishing process) was installed, and started operating. |
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Dec. 2004
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The Tianjin Factory was granted a certificate of authority. |
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Jun. 2005
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The head office, the Matsumoto Factory, and the Toyoshina Factory were ISO14001: 2004 certified.
The Toyoshina Factory was ISO9001: 2000 certified. |
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Aug. 2005
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An upright deposition apparatus (for a bright finishing process) was newly installed. |
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Oct. 2005
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Two booth lines for UV coating were newly installed. |
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Nov. 2005
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An upright ion plating apparatus was newly installed, and started operating in the Tianjin Factory, China. Also, an automatic coating line was newly installed. |
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Jan. 2006
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A molding factory was newly established. |
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Apr. 2006
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The new molding factory started operating. |
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Jul. 2006
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An upright deposition apparatus (for a bright finishing process) was newly installed. |
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Oct. 2006
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A horizontal ion-plating apparatus was newly installed in the Tianjin Factory, China. |
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Apr. 2007
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An additional horizontal ion-plating apparatus was installed in the Tianjin Factory, China. |
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Jul. 2007
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The capital was increased from 10 million yen to 50 million yen. |
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Jul. 2007
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The joint venture in Dong Guan, Guangdong , China was dissolved. |
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Aug. 2007
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Additional production facilities were installed in the Tianjin Factory, China. |
| Dec. 2007 |
Expanding construction of clean
rooms in Matsumoto Factory |